Aberration correction optical system

Details Aberration correction optical system Aberration correction optical system

2006-01-17

2006-01-17

Schwartz, Jordan M. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S668000, C359S710000

Reexamination Certificate

active

06987621

ABSTRACT:
A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

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