Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2006-01-17
2006-01-17
Schwartz, Jordan M. (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S668000, C359S710000
Reexamination Certificate
active
06987621
ABSTRACT:
A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.
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Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Schwartz Jordan M.
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