Aberration adjusting method, device fabrication method, and...

Details Aberration adjusting method, device fabrication method, and... Aberration adjusting method, device fabrication method, and...

2007-06-12

2007-06-12

Nguyen, Kiet T. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S492230

Reexamination Certificate

active

11337444

ABSTRACT:
An aberration adjusting method of a charged particle beam optical system. The method includes an aberration measuring step of measuring N aberrations of the charged particle beam optical system, an aberration sensitivity acquiring step of changing M control amounts to control optical elements included in the charged particle beam optical system, obtaining variations of the N aberrations by executing the aberration measuring step, and obtaining aberration sensitivities of the M control amounts. The method further includes a control amount deciding step of deciding the M control amounts on the basis of the N aberrations and the aberration sensitivities of the M control amounts to set the N aberrations to target aberrations. The aberration is a displacement of each image height of charged particles beams. The control amount is an amount for controlling a position of the charged particle beams, and M<N, in which M and N are positive integers.

REFERENCES:
patent: 5834783 (1998-11-01), Muraki et al.
patent: 5973332 (1999-10-01), Muraki et al.
patent: 6037601 (2000-03-01), Okunuki
patent: 6166387 (2000-12-01), Muraki et al.
patent: 6323499 (2001-11-01), Muraki et al.
patent: 6982427 (2006-01-01), Kawasaki et al.
patent: 9-245708 (1997-09-01), None
patent: 2004-153245 (2004-05-01), None

Affiliated with

Also associated with

Rating

Aberration adjusting method, device fabrication method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aberration adjusting method, device fabrication method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aberration adjusting method, device fabrication method, and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3824397