A1 alloy films and melting A1 alloy sputtering targets for depos

Stock material or miscellaneous articles – Liquid crystal optical display having layer of specified... – With viewing layer of specified composition

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20429813, 20419227, 148437, 420528, 420552, 349111, 428620, C23C 2100, C23C 1434

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059766417

ABSTRACT:
An Al alloy film containing one kind or two or more kinds of alloy components selected from a group of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and Mn in a total amount of 0.1 to 10 at %, and a melting Al alloy sputtering target for depositing the Al alloy film, wherein the above-mentioned film is used as a reflection film for an optical recording medium, a shading film for a liquid crystal display panel or for a solid image pickup device, and an Al alloy thin film line or electrode material for a semiconductor device.

REFERENCES:
patent: 2781261 (1957-02-01), Kamlet
patent: 3387970 (1968-06-01), Wainer
patent: 3470426 (1969-09-01), Feldman
patent: 3862017 (1975-01-01), Tsunemitsu et al.
patent: 3955039 (1976-05-01), Roschy et al.
patent: 4024567 (1977-05-01), Iwata et al.
patent: 4085011 (1978-04-01), Juergens et al.
patent: 4606981 (1986-08-01), Mizuhara
patent: 4929421 (1990-05-01), Jin et al.
patent: 5018004 (1991-05-01), Okinaga et al.
patent: 5019891 (1991-05-01), Onuki et al.
patent: 5041700 (1991-08-01), Iyogi et al.
patent: 5051812 (1991-09-01), Onuki et al.
patent: 5100488 (1992-03-01), Sigworth
patent: 5124779 (1992-06-01), Furukawa et al.
patent: 5541007 (1996-07-01), Ueda et al.
patent: 5654058 (1997-08-01), Kirino et al.
Matsui et al., "Formation of amorphous Al-Cr and Al-Mn alloy films by rf sputtering", Journal of Non-Crystalline Solids 124, pp. 121-130, Apr. 1990.
Stanley Wolf, Ph.D., "Silicon Processing for the VLSI Era", vol. 2: rocess Integration TK 7874.W6, 1986 v.2, c.10, pp. 1-11, 182-187, (No Month).
James J. Brophy, "Basic Electronics for Scientists", 1966, pp. 6-7, 50-55 (No Month).
G.D. Davis, et al, "Evolution of the Chemistry of Passive Films of Sputter-Deposited, supersaturated A1 Alloys", J. Electrochem. Soc., vol. 137, No. 2, Feb. 1990, pp. 442-427.
"Microstructural Characterization of Rapidly Solidified Al-Tal Alloys", Metallurgical Transactions A, vol. 18A, Nov. 1987, S. Singh, et al, India.
binary phase diagrams handbook, William G. Moffatt, 1976, General Electric, USA. (No Month).

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