A computerized pattern development system capable of direct desi

Boots – shoes – and leggings

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364468, 36447424, G06F 1546

Patent

active

053413059

ABSTRACT:
A pattern development system for use during the garment development process includes a digitizer with a work surface. The designer draws the lines of the garment pattern on the work surface with a stylus that enables the digitizer to present position signals to a controller in real time. The controller includes algorithms to compose the drawn lines into a garment pattern as well as compensate for human errors such as multiply drawn lines and missing line portions. The present system is transparent to the designer in operation as it adapts to the human designer rather than forcing the designer to adapt to the system.

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