Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-06-21
1999-03-16
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429803, 20429832, 20429834, 156345, 118723E, 118624, C23C 1434
Patent
active
058824928
ABSTRACT:
An AC plasma processing system according to the present invention may include a transformer for placing an alternating current on a first electrode and a second electrode contained within a process chamber. The secondary winding of the transformer is connected across the first and second electrodes. The primary winding of the transformer is connected to an external power supply. A switching device connected to the primary winding of the transformer periodically short circuits the primary winding to induce a secondary voltage in the secondary winding that is less than the arcing voltage associated with the process chamber.
REFERENCES:
patent: 4103324 (1978-07-01), Vandervelen et al.
patent: 4931169 (1990-06-01), Scherer et al.
patent: 4936960 (1990-06-01), Siefkes et al.
patent: 4963238 (1990-10-01), Siefkes et al.
patent: 4981566 (1991-01-01), Wuczinger
patent: 5006213 (1991-04-01), Sichmann et al.
patent: 5009764 (1991-04-01), Siefkes et al.
patent: 5074984 (1991-12-01), Sichmann et al.
patent: 5108571 (1992-04-01), Ludwig et al.
patent: 5126033 (1992-06-01), Szczyrbowski et al.
patent: 5147493 (1992-09-01), Nishimura et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5394061 (1995-02-01), Fujii
patent: 5399252 (1995-03-01), Scherer et al.
patent: 5422545 (1995-06-01), Felper et al.
patent: 5427669 (1995-06-01), Drummond
patent: 5682067 (1997-10-01), Manley et al.
Beisswenger, T. et al., "Economical Considerations on Modern Web Sputtering Technology", Society of Vacuum Coaters, 35th Annual Technical Coinferece Proceedings, pp. 128-134 (1992).
Anderson, L., "A New Technique for Arc Control in DC Sputtering", Society of Vacuum Coaters 35th Annual technical Conference Proceedings, pp. 325-329 (1992).
Schatz, Doug, "The MDX as a Strategic Tool in reducing Arcing", Application Notes, Advanced Energy Industries, Inc. (1985).
Billings Keith H.
Manley Barry W.
Dahl, Esq. Bruce E.
Nguyen Nam
Sierra Applied Sciences, Inc.
VerSteeg Steven H.
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