Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1989-05-10
1991-06-18
Raymond, Girard L.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 58, 430 72, 430 73, 430 74, 430 75, 430 76, 430 78, 546143, 546159, 546285, 549 68, 549480, 564318, 564391, G03G 506, G03G 509, C07C21131
Patent
active
050249126
ABSTRACT:
A 5H-dibenzo [a,d] cycloheptenylidene derivative and a 5H-dibenzo [1,d] cycloheptenylidene derivative represented by the following general formula [I]: ##STR1## wherein X is --CH.sub.2 --CH.sub.2 -- or --CH.dbd.CH--; R.sub.1 and R.sub.2 are alkyl groups, aralkyl groups, aromatic groups or heterocyclic groups, R.sub.3 and R.sub.4 are hydrogen atoms, alkyl groups, alkoxy groups or halogen atoms; and Ar.sub.1 is an aromatic group or a heterocyclic group, process for producing those derivatives, and electrophotographic photosensitive member using the same.
REFERENCES:
patent: 3472869 (1969-10-01), Humber
patent: 3533786 (1970-10-01), Looker
patent: 4070373 (1978-01-01), Winter et al.
patent: 4245021 (1981-01-01), Kazami et al.
patent: 4579799 (1986-04-01), Katagiri et al.
Streitweiser, A., Murdock, J. R., Haefelinger, G., and Chang, C. J., "Acidity of Hydrocarbons XLVI. Equilibrium Ion Pair Acidities of Mono-Di-Triaryl Methanes Toward Cesium Cyclohexamide", J.A.C.S., 95:13, pp. 4248-4254 (Jun. 27, 1973).
Kikuchi Toshihiro
Matsumoto Masakazu
Neishi Toshie
Suzuki Koichi
Takiguchi Takao
Canon Kabushiki Kaisha
Raymond Girard L.
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