4-substituted 3,3-dimethyl-butan-2-ones, processes for their pre

Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

568306, 568414, C07C 49163

Patent

active

RE0321222

ABSTRACT:
4-substituted 3,3-dimethyl-butan-2-ones of the formula ##STR1## in which R represents cyano or the group --X--R',
wherein

REFERENCES:
patent: 2374283 (1945-04-01), Grun et al.
patent: 3625836 (1971-12-01), Stansbury
patent: 4141919 (1979-02-01), Gremmelmaier
patent: 4180585 (1979-12-01), Goudia
patent: 4254132 (1981-03-01), Kramer
patent: 4255434 (1981-03-01), Kramer
patent: 4267381 (1981-05-01), Jautelat et al.
patent: 4371708 (1983-02-01), Kramer et al.
patent: 4399309 (1983-08-01), Jautelat et al.
Bisagni et al., "Chemical Abstract", vol. 72 (1970), p12289a.
Hayami "Tetrahedron Letters " No. 11, pp. 1385-1386, Pergaman Press Britian.
Chemical Abstracts, 80,81987d, "Reactions of ketenimines with Peracids, ozone, and methylene-transfer reagents", Crandall.
J. Org. Chem., "Acyl Rearrangements in Radical Reactions", Karl et al, vol. 37, 2834-40 (1972).
J. Organ. Chem., "Synthesis of w-Bromo Ketones", House et al; vol. 42, 1710 (1977).
JP-Abstract, Derwent, 4861/1963, "2-Methyl-2-methoxy-petanone-4" Chemical Abstr. 82, Aliphatic Compounds, Yale et al, 30898j (1975).
J. Am. Chem. Soc. 98, "Oxidation of Ethers via Hydride Abstraction . . . "; 7882-84 (1976).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

4-substituted 3,3-dimethyl-butan-2-ones, processes for their pre does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with 4-substituted 3,3-dimethyl-butan-2-ones, processes for their pre, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 4-substituted 3,3-dimethyl-butan-2-ones, processes for their pre will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1908163

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.