3D two-photon lithographic microfabrication system

Details 3D two-photon lithographic microfabrication system 3D two-photon lithographic microfabrication system

2011-03-08

2011-03-08

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C398S141000, C398S180000, C398S189000, C359S326000

Reexamination Certificate

active

07902526

ABSTRACT:
An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.

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Kim et al., “Axial resolution for two-photon wide-field illumination microscopy and microfabrication” Multiphonon Microscpoy in Biomedical Sciences VIII, Edited by Ammasai Periasamy, Peter T.C.: Proc. of SPIE, 2008, vol. 6860, 68028-1˜686028-7.

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