3-5 group compound semiconductor, process for producing the...

Details 3-5 group compound semiconductor, process for producing the... 3-5 group compound semiconductor, process for producing the...

2007-06-12

2007-06-12

Gupta, Yogendra N. (Department: 1722)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Processes of growth with a subsequent step of heat treating...

C117S002000, C117S084000, C117S088000, C117S906000, C117S952000

Reexamination Certificate

active

10352934

ABSTRACT:
Provided is an excellent p-type nitride type 3-5 group compound semiconductor having escellent electrical properties such as a low contact resistance to an electrode metal, a low ohmic property, etc., by heat-treating a nitride type 3-5 group compound semiconductor doped with p-type dopant in an hydrogen-containing gas atmosphere of a specific concentration.

REFERENCES:
patent: 5902393 (1999-05-01), Nido et al.
patent: 5926726 (1999-07-01), Bour et al.
patent: 6008539 (1999-12-01), Shibata et al.
patent: 6043140 (2000-03-01), Kawai et al.
patent: 6291840 (2001-09-01), Uemura et al.
patent: 6464793 (2002-10-01), Nishizawa et al.
patent: 6562129 (2003-05-01), Hasegawa et al.
patent: 6861340 (2005-03-01), Takeya
patent: 5-183189 (1993-07-01), None
patent: 8-8460 (1996-01-01), None
patent: 8-32113 (1996-02-01), None
patent: 8-125222 (1996-05-01), None
patent: 8-325094 (1996-12-01), None
patent: 9-40490 (1997-02-01), None
patent: 9-129929 (1997-05-01), None
patent: 9-199758 (1997-07-01), None
patent: 10-209493 (1998-08-01), None
patent: 2002026024 (2002-01-01), None

Affiliated with

Also associated with

Rating

3-5 group compound semiconductor, process for producing the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with 3-5 group compound semiconductor, process for producing the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 3-5 group compound semiconductor, process for producing the... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3865989