Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor...
Reexamination Certificate
2004-12-13
2010-06-01
Andújar, Leonardo (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
C257SE49001, C257SE49002, C438S095000
Reexamination Certificate
active
07728327
ABSTRACT:
Provided is a 2-terminal semiconductor device that uses an abrupt MIT semiconductor material layer. The 2-terminal semiconductor device includes a first electrode layer, an abrupt MIT semiconductor organic or inorganic material layer having an energy gap less than 2eV and holes in a hole level disposed on the first electrode layer, and a second electrode layer disposed on the abrupt MIT semiconductor organic or inorganic material layer. An abrupt MIT is generated in the abrupt MIT semiconductor material layer by a field applied between the first electrode layer and the second electrode layer.
REFERENCES:
patent: 5687112 (1997-11-01), Ovshinsky
patent: 6087674 (2000-07-01), Ovshinsky et al.
patent: 6121642 (2000-09-01), Newns
patent: 6624463 (2003-09-01), Kim et al.
patent: 6638820 (2003-10-01), Moore
patent: 2003/0054615 (2003-03-01), Kim et al.
patent: 2003/0155602 (2003-08-01), Krieger et al.
patent: 2003/0156447 (2003-08-01), Kozicki
patent: 2003/0173612 (2003-09-01), Krieger et al.
patent: 2003/0178660 (2003-09-01), Schmid et al.
patent: 2004/0178414 (2004-09-01), Frey et al.
patent: 2005/0139867 (2005-06-01), Saito et al.
patent: 2008/0197916 (2008-08-01), Kim et al.
patent: 2009/0114896 (2009-05-01), Kim et al.
patent: 2009/0230428 (2009-09-01), Youn et al.
patent: 2009/0230940 (2009-09-01), Lim et al.
patent: 09-129839 (1997-05-01), None
patent: 10-056177 (1998-02-01), None
patent: 11163365 (1999-06-01), None
patent: 1020030024145 (2003-03-01), None
Zhou, C., “A Field Effect Transistor Based on the Mott Transition in a Molecular Layer”, Appl Phys. Lett. 70 (No. 5) pp. 598-600 (Feb. 3, 1997).
Torrance, J. B., “The Difference between Metallic and Insulating Salts of Tetracyanoquinodimethane (TCNQ): How to Design an Organic Metal”, Acc. Chem. Res. 12, 79 pp. 79-86 (1979).
Mott, N.F. “Metal-Insulator Transition”. Review of Modern Physics, vol. 40, #4, pp. 677-683 (Oct. 1968).
Machine English Translation of JP11-163365.
“Strong hybridization in vanadium oxides: evidence from photoemission and absorption spectroscopy”, 1998 IOP Publishing Ltd., pp. 5697-5716.
A field effect transistor based on the Mott transition in a molecular layer, C. Zhou, et al., Appl Phys. Lett 70, Feb. 3, 1997, 1997 American Institute of Physics.
“Mott transition field effect transistor”, D. M. Newns, et al, 1998 American Institute of Physics, Applied Physics Letters, vol. 73, No. 6, Aug. 10, 1998.
“Extended Brinkman-Rice Picture and Its Application to High-Tc Superconductors”, H. Kim, pp. 1-17.
“Mechanism and observation of Mott transition in Vo2-based two-and three-terminal devices”, H. Kim, et al., Ne Journal of Physics 6, New Journal of Physics.
Beck A et al: “Reproducible switching effect in thin oxide films for memory applications” Aoolied Physics Leeters, AIP, American Institute of Physics, Melville, NY, vol. 77 No. 1, Jul. 1, 2000, pp. 139-141.
Newns, D. M., et al., “Mott Transition Field Effect Transistor”,American Institute of Physicsvol. 73, No. 6, Aug. 10, 1998, (Jun. 8, 1998), 1-3.
Chae Byung Gyu
Kang Kwang Yong
Kim Gyungock
Kim Hyun Tak
Kim Seong Hyun
Andújar Leonardo
Blakely & Sokoloff, Taylor & Zafman
Electronics and Telecommunications Research Institute
Roland Christopher M
LandOfFree
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