Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1996-03-18
1997-10-07
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
430627, 430931, 524 91, 526259, 548259, 548260, G03C 1815
Patent
active
056746709
ABSTRACT:
A photographic element comprising a light sensitive portion and an ultraviolet absorbing polymer comprising repeating units of a 2'-hydroxphenyl benzotriazole with a 5- or 6-substituent selected from halogen, cyano, carboxy or a sulfonyl, and a 4'-alkoxy group in which the alkylene portion of the alkoxy is linked, in sequence through a first optional bivalent linking group, then an oxygen, sulfur or amino group, then a second optional bivalent linking group, to the polymer chain, provided that the 3'-position is unsubsituted and the 4'-substituent does not have any --NH--, --OH or --SH substituents.
REFERENCES:
patent: 3004896 (1961-10-01), Heller et al.
patent: 3072585 (1963-01-01), Milionis et la.
patent: 3493539 (1970-02-01), Skoultchi et al.
patent: 3761272 (1973-09-01), Mannens et al.
patent: 3813255 (1974-05-01), Mannens et al.
patent: 4496650 (1985-01-01), Yagihara et al.
patent: 4663272 (1987-05-01), Nakamura
patent: 4716234 (1987-12-01), Dunks et al.
patent: 4943519 (1990-07-01), Helling et al.
patent: 5099027 (1992-03-01), Vogl et al.
patent: 5372922 (1994-12-01), Schofield et al.
patent: 5384235 (1995-01-01), Chen et al.
patent: 5455152 (1995-10-01), Vishwakarma
Chen Tien-teh
Vishwakarma Lal Chand
Yau Hwei-Ling
Eastman Kodak Company
Rice Edith A.
Schilling Richard L.
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