Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acids and salts thereof
Patent
1993-02-19
1994-10-04
Chan, Nicky
Organic compounds -- part of the class 532-570 series
Organic compounds
Carboxylic acids and salts thereof
C07C32362
Patent
active
053528212
ABSTRACT:
The present invention is directed to novel 2,5-dichlorophenylthioglycolic acid derivative, a process for their production and a process for producing the desired product 2,5-dichlorophenylthioglycolic acid derived from said novel compounds. 2,5-dichlorophenylthioglycolic acid derivative of the present invention can be obtained by reacting 2,4,5-trichlorobenzensulfonates and thioglycolic acid in the presence of base, and said desired product can be obtained by desulfonating said compound in an aqueous solution of mineral acid. Novel 4-carboxymethylthio-2,5-dichlorobenzenesulfonates of the present invention can be used advantageously as an intermediate for the production of 2,5-dichlorophenylthioglycolic acid. The use of said intermediate makes it possible to obtain the desired product in a decreased process steps with high yield. In addition, it poses no problem of environmental pollution as pointed out with conventional methods because it uses no heavy metals.
REFERENCES:
patent: 3440288 (1969-04-01), Hoffmann et al.
Chemical Abstracts 68:59210A (1968).
Galat, J. American Chemical Society, 74, pp. 3890-3891 (1951).
Cecchetti et al., J. Medicinal Chemistry, 30, pp. 465-473 (1987).
Goda Hiroshi
Kimura Nario
Yoshida Katsuhiko
Yoshikawa Naohiro
Chan Nicky
Sumitomo Seika Chemicals Co. Ltd.
LandOfFree
2,5-dichlorophenylthioglycolic acid derivative and method for it does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with 2,5-dichlorophenylthioglycolic acid derivative and method for it, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 2,5-dichlorophenylthioglycolic acid derivative and method for it will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-582676