2,4-diamino-s-triazinyl group-containing polymer and negative ra

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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Details

525480, 43027011, C08F28300, C08G 828

Patent

active

056188927

ABSTRACT:
A polyhydroxystyrene having a 2,4-diamino-s-triazinyl group substituted for 1-50 mol % of its hydroxyl group and a weight average molecular weight of 3,000-50,000 is provided. A negative radiation-sensitive resist composition comprising the polymer, preferably along with a photo-acid generator and a crosslinking agent has high resolution and developability, affords a resist pattern of rectangular profile, and is shelf stable. The composition is thus very useful as resist material for LSI manufacture.

REFERENCES:
patent: 5506279 (1996-04-01), Babu et al.
patent: 5510233 (1996-04-01), Nakanishi et al.

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