Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-03-17
1997-12-16
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430311, 430326, G03F 7023, G03C 161
Patent
active
056983620
ABSTRACT:
A photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) containing a 1,2-quinonediazide group, and a compound (C) of the following formula (I): ##STR1## wherein each of Ar.sup.1 to Ar.sup.3 which are independent of one another, is an aromatic hydrocarbon group which may be substituted by a halogen atom, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group, and R is a hydrogen atom, a hydroxyl group, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group.
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Journal of Photopolymer Science and Technology, vol. 4, No. 3, 1991, pp. 318-335.
Ikemoto Makoto
Kawase Yasuhiro
Kusumoto Tadashi
Nakano Koji
Nishi Mineo
Mitsubishi Chemical Corporation
Young Christopher G.
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