Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-10-07
1989-05-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430189, 430190, 430193, 534556, G03C 154, C07C11300
Patent
active
048350850
ABSTRACT:
Compounds of the general formula (I) or (II) ##STR1## in which R is 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl and X is a straight-chain or branched C.sub.1 -C.sub.12 -alkylene group, which is unsubstituted or mono- or disubstituted by OH group or is --CH.dbd.CH--, are suitable as the light-sensitive component in photoresist materials. Both positive and negative images can be prepared with light-sensitive mixtures containing these compounds and a binder.
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patent: 3248220 (1966-04-01), Van Rhijn
patent: 3531414 (1970-09-01), Randell et al.
patent: 4104070 (1978-08-01), Moritz et al.
Bowers Jr. Charles L.
Ciba-Geigy Corporation
Hall Luther A. R.
Villamizar JoAnn
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