4. Metal working
  5. Barrier layer or semiconductor device making
  6. Barrier layer device making
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Huang Yung-Shang

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Hueschen Robert E.

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Hulting Karen J

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I-Tsung Fang

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Iljin Nanotech Co., Ltd.

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Inoue Koshi

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Interligne

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Ishii Kiyohiro

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Jow T. Richard

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Kamigawa Hidenori

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Kanetoku Sadao

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Karnik Tomas

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Kawakita Nario

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Kawakubo Tetsuya

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Kawamura Junkichi

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Kee Lik Wing

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Keenan Richard L.

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Kemet Electonics Corporation

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KEMET Electronics Corporation

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Keser Milan

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