4. Metal working
  5. Barrier layer or semiconductor device making
  6. Barrier layer device making
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Gaal Otto

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Gaffney Kevin M.

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Gebhardt Karl

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Geiculescu A. Corina

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GKN Floform Limited

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Goddecke Hubert

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Goodwin Mark L.

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Haans Petrus F. A.

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Hanchen Gunther

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Hanson James M.

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Hartta Matti O.

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Hashiba Shiroh

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Hashima Akiyoshi

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Hemphill R. Jason

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Hermans Peter

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Hirata Yoshio

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Hoffarth Joseph Gerard

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Holm Robert Leander

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Horá{hacek over (c)}ek Ivan

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Hoshidenki-Seizo Kabushiki Kaisha

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