Photosensitive composition with azide or bisazide compound with

Details Photosensitive composition with azide or bisazide compound with Photosensitive composition with azide or bisazide compound with

1986-01-14

1988-03-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

260349, 430194, 430325, 430927, G03C 152, G03C 171

Patent

active

047285940

ABSTRACT:
A photosensitive composition comprising an azide compound represented by the formula: ##STR1## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.

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patent: 4308341 (1981-12-01), DoMill
patent: 4565768 (1986-01-01), Nonogaki et al.
Kosar, J., "Light-Sensitive Systems, J. Wiley & Sons, 1965, pp. 330-336.

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