Process for producing the passivation layer of an active matrix

Details Process for producing the passivation layer of an active matrix Process for producing the passivation layer of an active matrix

1993-01-26

1995-12-19

Sikes, William L.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359 60, 359 74, 359 87, G02F 1136, H01L 2120

Patent

active

054773555

ABSTRACT:
A photoresist 10 is exposed to light from behind a substrate by using as photomask a wiring electrodes 2 and 4 and a switching element 8 which are individually composed of an opaque member, whereby a passivation layer 9 for the switching element 8 is patterned. By virtue of this method, a photomask becomes unnecessary and jogs of the passivation layer 9 can be formed outside the transparent pixel electrode 7. Therefore, an unsatisfactory orientation of a liquid crystal can be made invisible without enlarging the black matrix of a counter substrate. Furthermore, since a passivation layer can be removed in portions not requiring the passivation layer, image-sticking can be reduced and the quality of displayed picture can be greatly improved. The present invention makes it possible to reduce the number of photomasks used for production of an actively addressing substrate and improve the picture quality of a liquid crystal display.

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