Photosensitive member for electrophotography and process for mak

Details Photosensitive member for electrophotography and process for mak Photosensitive member for electrophotography and process for mak

1990-05-15

1991-10-15

Welsh, David

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430130, 430134, G03G 582, G03G 514

Patent

active

050573918

ABSTRACT:
A photosensitive member for electrophotography comprising a photoconductive layer formed on an electro- conductive support, in which the photoconductive layer is composed of an amorphous silicon germanium layer formed by electron cyclotron resonance (ECR) method and containing hydrogen and/or halogen in an amount of more than 40 at. % to 65 at. % and an amorphous silicon nitride layer formed by ECR method and containing hydrogen and/or halogen in an amount of more than 40 at. % to 60 at. %, the amorphous silicon nitride layer being laminated on the amorphous silicon germanium layer; said member exhibiting an increased sensitivity to laser rays having a long wavelength and an improved charge retention capacity.

REFERENCES:
patent: 4760008 (1988-07-01), Yamazaki et al.
patent: 4818651 (1989-04-01), Shirai et al.
patent: 4859554 (1989-08-01), Yamazaki et al.

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