Semiconductor device and reticle used for fabricating the same

Details Semiconductor device and reticle used for fabricating the same Semiconductor device and reticle used for fabricating the same

1992-06-26

1995-06-06

Jackson, Jerome

Active solid-state devices (e.g., transistors, solid-state diode

Integrated circuit structure with electrically isolated...

Including dielectric isolation means

257296, 257288, H01L 2978, H01L 2906

Patent

active

054225124

ABSTRACT:
A semiconductor device is provided with a device formation region formed by etching with using a reticle as an etching mask. The device formation region is shaped to have at least two curved portions having different radiuses, being encircled with an insulation layer, so that radiated light is not converged to a point of an inside of the device formation region by light reflection on an inner edge of the insulation layer.

REFERENCES:
patent: 3883948 (1975-05-01), Allison
patent: 4012764 (1977-03-01), Satonaka
patent: 4763178 (1988-08-01), Sakui
patent: 5021359 (1991-06-01), Young et al.
patent: 5094973 (1992-03-01), Pang
patent: 5101261 (1992-03-01), Maeda

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