Polishing machine for flattening substrate surface

Details Polishing machine for flattening substrate surface Polishing machine for flattening substrate surface

1998-12-02

2000-12-26

Scherbel, David A.

Abrading

Machine

Rotary tool

451550, 451283, 451363, 451446, 451290, 451332, B24B 700

Patent

active

061650560

ABSTRACT:
There is disclosed a polishing machine capable of flattening a wafer surface uniformly. The machine can modify the flatness of the surface during polishing. The machine has an index table and a polishing head 18. The table attracts the wafer to be polished such that the wafer faces upward. The table rotates to the primary polishing station. The polishing head has a pressure application cylinder 21 and a base plate 22. The cylinder is held to a carrier at a given angle. The base plate holds polishing cloth 24 and is mounted to the cylinder so as to be swingable in three dimensions. The cloth touches the wafer surface and rotates at a high speed, thus flattening it. At the second polishing station, polishing cloth attached to another polishing head touches the wafer surface and rotates at a high speed, thus finally polishing the wafer surface.

REFERENCES:
patent: 4890420 (1990-01-01), Azimi
patent: 4916868 (1990-04-01), Wittstock
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5895270 (1999-04-01), Hempel, Jr.
patent: 5921855 (1999-07-01), Osterheld et al.
patent: 5927264 (1999-07-01), Worley
patent: 5931722 (1999-08-01), Ohmi et al.

Affiliated with

Also associated with

Rating

Polishing machine for flattening substrate surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing machine for flattening substrate surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing machine for flattening substrate surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-989291