Controlling process modules using site models and monitor wafer

Details Controlling process modules using site models and monitor wafer Controlling process modules using site models and monitor wafer

1996-09-24

1998-05-12

Ruggiero, Joseph

Boots, shoes, and leggings

364151, 364552, 364490, 36446828, G06F 1900

Patent

active

057515824

ABSTRACT:
A method is described for controlling a plurality of nonuniformity parameters in processing discrete products such as semiconductor wafers through a module consisting of several individual processes using site models. The method uses a controlled process to compensate for a subsequent uncontrolled process, which allows process goals of one process to be optimized to enhance the output of a subsequent process of the same module.

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patent: 5546312 (1996-08-01), Mozumder et al.
patent: 5568408 (1996-10-01), Maeda
patent: 5661669 (1997-08-01), Mozumder et al.
"Simultaneous Control of Multiple Measures of Nonuniformity Using Site Models and Monitor Wafer Control", Saxena et al., Semiconductor Process and Device Center, Apr. 11, 1995, pp. 1-14.

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