Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1999-04-01
2000-09-12
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250358, H01J 3730
Patent
active
061181293
ABSTRACT:
A method for exposing an exposure pattern on an object by a charged particle beam, including the steps of: shaping a charged particle beam into a plurality of charged particle beam elements in response to first bitmap data indicative of an exposure pattern, such that the plurality of charged particle beam elements are selectively turned off in response to the first bitmap data; focusing the charged particle beam elements upon a surface of an object; and scanning the surface of the object by the charged particle beam elements; the step of shaping including the steps of: expanding pattern data of said exposure pattern into second bitmap data having a resolution of n times (n.gtoreq.2) as large as, and m times (m.gtoreq.1) as large as, a corresponding resolution of the first bitmap data, respectively in X- and Y-directions; dividing the second bitmap data into cells each having a size of 2n bits in the X-direction and 2m bits in said Y-direction; and creating the first bitmap data from the second bitmap data by selecting four data bits from each of the cells, such that a selection of the data bits is made in each of the cells with a regularity in the X- and Y-directions and such that the number of rows in the X-direction and the number of columns in the Y-direction are both equal to 3 or more.
REFERENCES:
patent: 4433384 (1984-02-01), Berrian et al.
patent: 4511980 (1985-04-01), Watanabe
patent: 4541115 (1985-09-01), Werth
patent: 4641252 (1987-02-01), Tokita
patent: 4661709 (1987-04-01), Walker et al.
patent: 5041764 (1991-08-01), Midland et al.
patent: 5262341 (1993-11-01), Fueki et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5391886 (1995-02-01), Yamada et al.
patent: 5430304 (1995-07-01), Yasuda et al.
patent: 5444257 (1995-08-01), Satoh et al.
patent: 5448075 (1995-09-01), Fueki et al.
patent: 5500930 (1996-03-01), Fueki
patent: 5866300 (1999-02-01), Satoh et al.
Abe Tomohiko
Arai Soichiro
Betsui Keiichi
Kai Jun-ichi
Maruyama Shigeru
Anderson Bruce C.
Fujitsu Limited
LandOfFree
Method and system for exposing an exposure pattern on an object does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and system for exposing an exposure pattern on an object , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for exposing an exposure pattern on an object will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-98260