Photo mask and fabrication process therefor

Details Photo mask and fabrication process therefor Photo mask and fabrication process therefor

1996-04-19

1998-05-12

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03L 900

Patent

active

057502900

ABSTRACT:
After forming a light shielding layer 2 of ruthenium in a thickness of 70 nm and a reflection preventing layer 3 of a ruthenium oxide in thickness of 30 nm, and a photosensitive resin layer, a sililated layer is formed by electron beam lithography and sililation. Etching is performed for the photosensitive resin layer, and the reflection preventing layer and the light shielding layer are dry etched using oxygen gas with taking the sililated layer as a mask. By this, dimensional precision of a pattern of a photo mask can be improved.

REFERENCES:
patent: 5521031 (1996-05-01), Tennant et al.
patent: 5549994 (1996-08-01), Watanabe et al.

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