Method of making P-type compound semiconductor employing trimeth

Fishing – trapping – and vermin destroying

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437234, 437971, 437965, 437107, 148DIG110, 148DIG65, H01L 2120, H01L 2136

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051734451

ABSTRACT:
A P-type compound semiconductor layer doped with carbon is formed on a semi-insulating substrate by placing the substrate in a reactor, and carrying out vapor-phase epitaxy by feeding and thermally decomposing vapors of an organic metal compound including a methyl radical, arsine, and an alkyl compound of arsenic substantially simultaneously into the reactor so that a C-doped P-type compound semiconductor is deposited on the substrate.

REFERENCES:
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patent: 4935381 (1990-06-01), Speckman et al.
Moon et al., "A Comparative Study of Selective Carbon Doping in MOCVD GaAs Using Trimethylarsenic and Arsine"; Journal of Electronic Materials, vol. 19, No. 12, pp. 1351-1355, 1990.
Blaauw et al., "Metalorganic Chemical-Vapour-Deposition Growth and Characterization of GaAs"; Can. J. Phys., vol. 63, 1985; pp. 664-669.
Kuech et al.; "Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy"; Appl. Phys. Lett. 53(4); Oct. 1988; pp. 1317-1319.
Dorrity et al.; "Gallium Arsenide"; 1985; pp. 95-117.
Susaki et al, "Single Mode Transverse Junction Stripe Laser", IEEE Tokyo Section, 1978.

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