Photomask

Details Photomask Photomask

1991-02-12

1992-12-22

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428131, G03F 900

Patent

active

051733803

ABSTRACT:
In a photomask, a first and a second rectangular openings are formed in a shield layer which provided on a transparent plate. The first rectangular opening is disposed so as to deviate off normal lines of respective sides of the second rectangular opening. Thus, no diffraction images of the first and the second rectangular openings overlap zero-order diffraction images of the second and the first rectangular openings, respectively.

REFERENCES:
patent: 4764441 (1988-08-01), Ohta et al.
patent: 4873163 (1989-10-01), Watakabe et al.
patent: 4923772 (1990-05-01), Kirch et al.
patent: 5045417 (1991-09-01), Okamoto

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