Photolytic polymer and photoresist composition

Details Photolytic polymer and photoresist composition Photolytic polymer and photoresist composition

1993-08-30

1995-08-08

Lesmes, George F.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

430270, C08L 8104, C08G 7504

Patent

active

054399904

ABSTRACT:
There is provided an highpolymer of the formula: ##STR1## where at least one of R.sup.1 and R.sup.2 is either an alkyl group having 1 and 3 carbons atoms or an alkoxy group having 1 to 3 carbon atoms and the other is hydrogen, R.sup.3 is either a phenyl group or an alkyl group having 1 to 3 carbon atoms, x satisfies the condition that 0<x.ltoreq.1, n is a positive integer in the range of from 5 to 700, Y.sup.- is a non-nucleophilic paired ion.

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patent: 4108747 (1978-08-01), Crivello et al.
patent: 4173476 (1979-11-01), Smith et al.
patent: 5012001 (1991-04-01), Crivello
Crivello et al. J. Org. Chem., 1978, 43(15), 3055.
He et al. J. Org. Chem., 1992, 57, 759.
Crivello et al. J. Polym. Sci., Polym. Chem., 1987 25, 3293.

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