Photomask for semiconductor integrated circuit device

Details Photomask for semiconductor integrated circuit device Photomask for semiconductor integrated circuit device

1994-08-17

1995-08-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430321, G03F 900

Patent

active

054397650

ABSTRACT:
In making semiconductor patterns on a glass substrate by a light shielding substance such as chromium (Cr), the amount of necessary data and time to make the semiconductor patterns can be reduced. Patterns each having a size smaller in at least one direction than the resolution limit of an exposure device are previously arranged on the glass substrate at regular intervals smaller than the resolution limit and they are partially removed in accordance with the patterns for a semiconductor integrated circuit. Thus, a photomask can be provided for the semiconductor integrated circuit.

REFERENCES:
"Silicon Processing for the VLSI ERA", Lithography II: Optical Alignment Tools and Photomasks, pp. 476-489.

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