Process for producing multicolor display

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area

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Details

430 7, 430321, C25D 502

Patent

active

054395828

DESCRIPTION:

BRIEF SUMMARY
FIELD OF THE INVENTION

The present invention relates to a process for producing a multicolor display which is used for multicoloring display elements, such as a liquid crystal element and the like.


BACKGROUND OF THE INVENTION

A variety of processes for forming a color filter have been reported. Among them, the process employing electrodeposition is noticeable in the art. For example, Japanese Patent Application Ser. No. 3-12018 and Japanese Patent Kokai Publication No. 61-272720, the former filed by the present assignee, disclose the process comprising: forming an electroconductive layer on a substrate; forming a positive type photosensitive film thereon; pattern-wise exposing the film; removing the exposed part; and forming a desired colored layer by electrodeposition. Since a positive type photosensitive film is employed in this process, it is ideal that only the exposed part of the film is solubilized to a developer, whereby, the remaining photosensitive film still keeps photosensitivity and can repeat exposure and development.
However, in activity, the positive type photosensitive film adjacent to the edge of the formed colored layer is likely to be modified during the first developing, electrodepositing and heat curing and lose photosensitivity. The modified portion, in the subsequent colored layer forming process, often causes coloring failure, such as frame-like discoloration, or size failure, such as irregular pattern edge lines (see FIG. 9).
The present invention provides an improved process for producing a multicolor display by which a color filter having neither the coloring failure nor the size failure is obtained.


DISCLOSURE OF THE INVENTION

That is, the present invention provides a process for producing a multicolor display comprising the following steps: exposed to light through a mask having a desired pattern which is placed on the photosensitive resin layer, and developed to bare partially the surface of the electric conductive layer; conductive layer by an electrodepositing process; and remaining photosensitive resin layer is eluted with a removing solution which preferentially or selectively dissolves the photosensitive layer, to bare the remaining surface of the electric conductive layer.
The process above mentioned according to the present invention may further comprise any one of the following steps after said step (III): electric conductive layer by an electrodepositing process; electric conductive layer by a coating process; electric conductive layer by a metallic plating process; or colored by an oxidation or reduction process.
A substrate as shown in FIG. 1(a) or 1(b) has to be provided first. Any substrate can be employed as long as its surface has electric conductivity. For example, a composite of insulation base 1 such as glass or plastics with thin electric conductive layer 2 such as chromium, nickel or indium oxide formed thereon, as well as an intrinsic electric conductive substrate 1' such as iron, stainless steel or copper are employed. The composite substrate as shown in FIG. 1(a) is employed for the following description.
A positive photosensitive resin layer 3 is formed on the electric conductive layer 2 as shown in FIG. 1(c). The positive type photosensitive resin layer once formed can be pattern-wise exposed and developed repeatedly without additional application thereof. The positive type photosensitive resin layer can be formed from a resin composition which comprises a polymer having branched groups unstable to carboxylic acid and a photopolymerization initiator which produces acid upon exposure to light (see, for example, Japanese Patent Application Ser. No. 3-12018 filed by the present assignee).
The polymer having branched groups unstable to carboxylic acid is a homopolymer or a copolymer of monomers having branched groups unstable to carboxylic acid. Examples of the monomers having branched groups unstable to carboxylic acid include p-butoxycarbonyloxy-.alpha.-methylstyrene, p-t-butoxycarbonyloxystyrene, t-butyl-p-vinyl benzoate, t-butyl-p-isopropenylphe

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
Matsumura et al., Proceedings of Eurodisplay '90 (10. Int. Display Research Conference) 25 Sep. 1990, Amsterdam, "The New Process For Preparing Multicolor Filter For LCDs", pp. 240-243.
Allen, Photopolymerisation and 1-4 Photoimaging Science and Technology, (no month) 1989, Elsevier Science Publication, London, New York, Chapter 3, p. 99: "The Chemistry of Photoresists" by Turner et al.
Frechet et al., J. Imaging Sci., "New Approach to Imaging Systems Incorporating Chemical Amplification: Synthesis and Preliminary Evaluation of Novel Resists Based on Tertiary Copolycarbonates", 30, 59-64 (1986) (March-April).
Crivello, Polymer Eng. Sci., "Using Onium Salts", 23, 953 (1983) December.

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