Positive type and negative type ionization irradiation sensitive

Details Positive type and negative type ionization irradiation sensitive Positive type and negative type ionization irradiation sensitive

1990-03-29

1992-12-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430167, 430193, 430197, 430270, 430325, 430326, 430330, 430907, 430942, 430945, 430966, G03F 7022, G03F 7023, G03F 7012, G03F 732

Patent

active

051697408

ABSTRACT:
Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.

REFERENCES:
patent: 4500629 (1985-02-01), Irving et al.
patent: 4572890 (1986-02-01), Goodin et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4842983 (1989-06-01), Hasegawa
patent: 4859563 (1989-10-01), Miura et al.
patent: 5023311 (1991-06-01), Kubota

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