Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1999-03-02
2000-12-05
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430296, 430942, G03F 900
Patent
active
061564648
ABSTRACT:
Methods are disclosed for improving the yield of acceptable product from microlithography using a charged particle beam. According to the methods, exposure defects caused by an unsuitable stage velocity are reduced, and exposure-defect areas can be re-exposed after detection of an exposure defect. In preparation for exposure, pattern data are read. Next, stage position is read, and stage velocity is calculated. A determination is made of whether the stage velocity is greater than a specified value. If the stage velocity is greater than the specified value, the stage velocity is decreased to avoid exceeding a velocity limit at which continuous exposure is impossible. Exposure of the die commences. If exposure of all of the pattern portions of the die are successfully completed, then processing is terminated. If exposure of all the pattern portions were not successfully completed, processing returns to the step at which the error occurred and repeated.
REFERENCES:
patent: 5879842 (1999-03-01), Okino
Nikon Corporation
Young Christopher G.
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