Photo-mask and method of fabricating the same

Details Photo-mask and method of fabricating the same Photo-mask and method of fabricating the same

1998-01-21

2000-12-05

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061564605

ABSTRACT:
A photo-mask and a method of fabricating the same. A photo-mask comprises a quartz glass substrate, on which a clear area, a grey area, and a dark area formed over the quartz glass substrate. Incident light penetrates through the clear area completely, but only part of the incident light will go through the grey area since the other part of the incident light is absorbed by the grey area, On the other hand, incident light is blocked by the dark area completely.

REFERENCES:
patent: 4764432 (1988-08-01), Kalbitzer
patent: 5213916 (1993-05-01), Cronin et al.
patent: 5725975 (1998-03-01), Nakamura et al.
patent: 5936707 (1999-08-01), Nguyen et al.

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