Apparatus for the distribution of laser beams used during a sele

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

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2041572, 20415721, 250423P, 250281, 250284, 350174, 350370, 350385, B01D 5900, H01J 3934

Patent

active

049465678

ABSTRACT:
Apparatus for the distribution of laser beams used during a selective reaction in a process for isotope separation by lasers. The system comprises in an enclosure (10), a material in the form of a vapor flow, from which it is wished to extract one species, and laser sources (12) supplying pulses along beams S1 . . . Sn at selective excitation wavelengths .lambda.1 . . . .lambda.n and along a beam St at wavelength .lambda.t permitting a transforming of said excited species. The system incorporates partial reflection mirrors (Mi) arranged in such a way that the transmitted and reflected beams S1 . . . Sn, St are superimposed. A first part (P1) of these beams is directed to the enclosure and a second part (P2) to the mirror (Mi+1). Return means (14) make it possible to adjust the length of the path in enclosure (10) between two mirrors (Mi) and (Mi+1).

REFERENCES:
patent: 4035638 (1977-07-01), Szoke et al.
patent: 4072590 (1978-02-01), Niemann et al.
patent: 4082633 (1978-04-01), Eerkens
patent: 4174150 (1979-11-01), Congleton
patent: 4189646 (1980-02-01), Vanderleeden
patent: 4254336 (1981-03-01), Rostler
patent: 4762402 (1988-08-01), Michon et al.

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