Method for reducing or avoiding the formation of a silicon reces

Details Method for reducing or avoiding the formation of a silicon reces Method for reducing or avoiding the formation of a silicon reces

2000-01-18

2000-12-05

Carrillo, Sharidan

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

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Patent

active

061561266

ABSTRACT:
A method for cleaning a silicon wafer. The method includes intentionally exposing the wafer into a volatile solvent with a polarity between about 2 and 4, whereby the wafer is cleaned by the solvent such that the formation of silicon recesses in source/drain extension regions on the silicon wafer can be prevented or avoided.

REFERENCES:
patent: 5358809 (1994-10-01), Van Berkel
patent: 6025274 (2000-02-01), Lin et al.

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