Skin moisturizing product and process

Drug – bio-affecting and body treating compositions – Designated organic active ingredient containing – Peptide containing doai

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

514 21, 514847, 514801, 4241951, A61K 3712, A61K 3528

Patent

active

049421530

ABSTRACT:
A moisturizing product and process designed to let a user quickly and easily rehydrate and moisturize the skin at their convenience, at anytime and any place. The fomulas are a combination of purified water, with a soluble collagen and other products to be applied to treat dry skin to slow the damaging effect of sun, wind, polutents and toxins. Further, the solution of the formula has a Deionized Water and soluble collagen in combination with other additives is applied to the skin by means of a spray in a very fine mist. When the formula reaches the skin it begins to rehydrate the cells of the skin by binding the water to the skin with the collagen in the formula. The cells of the skin exposed to a harsh drying environment are replenished and rehydrated by the fine spray mist.

REFERENCES:
patent: 3991184 (1976-11-01), Kludas et al.
patent: 4255418 (1981-03-01), Bailey
patent: 4322020 (1982-03-01), Stone
patent: 4416873 (1983-11-01), Puchalski et al.
patent: 4597963 (1986-07-01), Deckner
patent: 4695456 (1987-09-01), Wilder
patent: 4722843 (1988-02-01), Vinson
Radulescu et al., "Hexestrol Acetate for the Treatment of Dystrophic Vaginitis", CA102:12396w, 1985.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Skin moisturizing product and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Skin moisturizing product and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Skin moisturizing product and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-95099

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.