Method for fabrication of a mask

Details Method for fabrication of a mask Method for fabrication of a mask

1992-01-14

1997-01-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430323, 428428, G03F 900

Patent

active

055976662

ABSTRACT:
The present invention relates to a method for fabrication of a mask capable of stabilizing the size and the thickness thereof.
A method for fabrication of a mask according to the present invention comprises a step for successively depositing an oxide layer and a Cr layer on a quartz plate, a step for successively etching said oxide layer and said Cr layer by an E-beam, and a step for extending said oxide in volume by an oxidation process to form a phase-shifter.
Therefore, the size and thickness of a mask can easily be controlled by using an oxide instead of PMMA of the photosensitive film as a phase-shifter and endurability of a mask can be improved.

REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4459325 (1984-07-01), Nozawa et al.
patent: 4873163 (1989-10-01), Watakabe et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto

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