Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1991-03-14
1992-06-23
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3730
Patent
active
051245604
ABSTRACT:
An electron beam exposure system comprises a beam source for producing an electron beam, a focusing unit for focusing the electron beam on the object, a first deflector for deflecting the electron beam over a first area, a second deflector for deflecting the electron beam over a second, smaller area, and a control unit for controlling the first and second deflectors by first and second deflector signals. The control unit includes a data control device for producing first address data in response to pattern data, a first memory for storing, in each address, the first deflection data and second, corresponding address data, a second memory for storing, in each address, the second deflection data, and a decoding unit supplied with the first and second deflection data for producing the first and second deflection control signals for controlling the first and second deflectors. The data processing unit, the first memory, the second memory, and the decoding unit are connected with each other by a bus, and each of the units connected to the bus has a data transmitter and a data receiver for sending and receiving data to and from other devices via the bus. Thereby, the first deflection data and the second address data are read out and outputted on the bus in response to the first address given thereto from the data control device, and the second deflection data read out from the second memory in response to the second address data, is outputted on the bus. The first and second deflection data are sent to a deflection controller via the bus and further to the first and second deflectors after conversion.
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Anderson Bruce C.
Fujitsu Limited
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