Photosensitive diazo resin composition with polyurethane resin h

Details Photosensitive diazo resin composition with polyurethane resin h Photosensitive diazo resin composition with polyurethane resin h

1989-09-22

1991-01-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430158, 430176, 430177, 430171, 430300, 430302, G03F 7021, G03C 160

Patent

active

049834916

ABSTRACT:
A photosensitive composition is described, comprising a diazonium compound and a polyurethane resin having a carboxyl group in its main chain. The composition can be developed with an aqueous alkali developer to provide a lithographic printing plate having a long press life.

REFERENCES:
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patent: 4289838 (1981-09-01), Rowe et al.
patent: 4337307 (1982-06-01), Neubauer
patent: 4467027 (1984-08-01), Yamamoto et al.
patent: 4608331 (1986-08-01), Bernstein et al.
patent: 4631245 (1986-12-01), Pawlowski
patent: 4877711 (1989-10-01), Aoai et al.

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