Apparatus for regulating substrate temperature in a continuous p

Details Apparatus for regulating substrate temperature in a continuous p Apparatus for regulating substrate temperature in a continuous p

1981-03-16

1983-06-28

Smith, John D.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118718, 118719, 118723, 118725, 427 39, C23C 1310

Patent

active

043899706

ABSTRACT:
Apparatus for raising a continuous substrate to a predetermined deposition temperature and thereafter maintaining it at that temperature as it advances through a glow discharge chamber. A lamp holder having a plurality of heater lamps extends substantially the length of the chamber. The lamps are selectively spaced apart along the length of travel of said substrate to provide a desired heating profile. A detector is engaged to control circuitry for continuously adjusting the intensity of the lamps to regulate substrate temperature.

REFERENCES:
patent: 2785082 (1957-03-01), Clough et al.
patent: 3240915 (1966-03-01), Carter et al.
patent: 4224355 (1980-09-01), Lampkin et al.

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