1975-01-22
1978-08-08
Wojciechowicz, Edward J.
357 59, H01L 2348
Patent
active
041060512
ABSTRACT:
A semiconductor device having an ohmic contact including a metal layer of molybdenum or tungsten on a first polycrystalline silicon layer, is provided with a second polycrystalline silicon layer on the metal layer, to prevent the subsequent oxidation of the metal layer.
REFERENCES:
patent: 3614547 (1971-10-01), May
patent: 3632436 (1972-01-01), Denning
patent: 3667008 (1972-05-01), Katnack
patent: 4042953 (1977-08-01), Hall
Dormer Leslie
Nuttall Roy
Ferranti Limited
Wojciechowicz Edward J.
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