Semiconductor devices

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 59, H01L 2348

Patent

active

041060512

ABSTRACT:
A semiconductor device having an ohmic contact including a metal layer of molybdenum or tungsten on a first polycrystalline silicon layer, is provided with a second polycrystalline silicon layer on the metal layer, to prevent the subsequent oxidation of the metal layer.

REFERENCES:
patent: 3614547 (1971-10-01), May
patent: 3632436 (1972-01-01), Denning
patent: 3667008 (1972-05-01), Katnack
patent: 4042953 (1977-08-01), Hall

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-922700

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.