Method for analyzing light intensity distribution in projection

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382280, G02B 1500

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055026540

ABSTRACT:
A novel method for analyzing a light intensity distribution on a flat surface in a projection system wherein a pattern is projected by use of a light through a pupil on the flat surface. The pattern is analyzed into plural polygonal elements where a combination of the polygonal elements constitutes the pattern. Fourier transformations of vertexes of each of the polygonal elements except for the pattern are calculated for subsequent addition and subtraction of the Fourier transformations of all the polygonal elements to thereby obtain a Fourier transformation of the pattern. A product of the Fourier transformation of the pattern and a pupil function is calculated for the pupil. An invert Fourier transformation of the product is calculated to thereby obtain a light intensity distribution.

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by Michael Yeung, "Modeling Aerial Images in Two and Three Dimensions", Proceedings of Kodak Microelectronics Seminar Interface '85, California, 1980, pp. 115-126.
by Marc D. Levenson et al., "The Phase-Shifting Mask II: Imaging Simulations and Submicrometer Resist Exposures", IEEE Transactions on Electron Devices, vol. ED-31, No. 6, Jun. 1984, pp. 753-762.

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