Stencil mask and charge particle beam exposure method and appara

Details Stencil mask and charge particle beam exposure method and appara Stencil mask and charge particle beam exposure method and appara

Filed on

1993-05-18

Date issued

1994-12-27

Examiner

Anderson, Bruce C.

Patent Class

Radiant energy

SubClass

Irradiation of objects or material

SubSubClass

Irradiation of semiconductor devices

Other Related Categories

250398, H01J 3730

Type

Patent

Status

active

Patent number

053768027

Description

ABSTRACT:
A stencil mask is used for exposing a pattern on a wafer using a charged particle beam which is transmitted through the stencil mask. The stencil mask is made up of a plate, and at least a block pattern region formed on the plate. The block pattern region includes apertures of arbitrary shapes for transmitting the charged particle beam which irradiates the apertures within the block pattern region in one shot of the charged particle beam. The block pattern region forms a block mask in which a pair of confronting blanking electrodes is provided with respect to at least predetermined ones of the apertures.

REFERENCES:
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5099133 (1992-03-01), Yamada
patent: 5144142 (1992-09-01), Fueki et al.

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