Method of polishing

Details Method of polishing Method of polishing

1996-12-17

1998-04-07

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 2, 134 6, 134 7, B08B 700

Patent

active

057359636

ABSTRACT:
A method for CMP of, illustratively, tungsten is disclosed. Hydroxylamine or hydroxylamine sulfate are employed to oxidize the metal, while gamma (.gamma.) alumina is employed to abrade the oxidized metal.

REFERENCES:
patent: 5225034 (1993-07-01), Yu et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5354490 (1994-10-01), Yu et al.
patent: 5527423 (1996-06-01), Neville et al.
Hydroxylamine Redox Properties of Hydroxylamines, Part 1. Inorganic Reactions M. Van Der Puy and J. H. Dimmit no date available.
Hydroxylamine Redox Properties of Hydroxylamines Part 2. Organic Reactions M. Van Der Puy no date available.
Oximes, Allied Signals no date available.

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