Dichromatic photomask and a method for its fabrication

Details Dichromatic photomask and a method for its fabrication Dichromatic photomask and a method for its fabrication

1995-01-31

1996-03-26

Seidleck, James J.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, 430325, 430326, 430328, 430329, G11B 726, G03F 900

Patent

active

055019269

ABSTRACT:
A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.

REFERENCES:
patent: 4363116 (1982-12-01), Kleuters et al.
patent: 4469424 (1984-09-01), Matsui et al.
patent: 4732844 (1988-03-01), Ota et al.
patent: 4767723 (1988-08-01), Hinsberg et al.
patent: 4839251 (1989-06-01), Ohta et al.
patent: 4893298 (1990-01-01), Pasman et al.
patent: 4953385 (1990-04-01), Aoki et al.
patent: 5060223 (1991-10-01), Segawa
Horigome, et al., "Novel Stamper Process for Optical Disc," SPIE vol. 899, Optical Storage Technology and Applications (1988), pp. 123-128.
Hinsberg, et al., "A Lithographic Analog of Color Photography: Self-Aligning Photolithography using a Resist with Wavelength-Dependent Tone," IBM Optical Media, RJ6750 (64597) Mar. 29, 1989, Chemistry.

Affiliated with

Also associated with

Rating

Dichromatic photomask and a method for its fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dichromatic photomask and a method for its fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dichromatic photomask and a method for its fabrication will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-914751