Projection exposure method and apparatus

Details Projection exposure method and apparatus Projection exposure method and apparatus

1998-08-21

1999-07-06

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Illumination systems or details

359766, G03B 2754, G02B 960

Patent

active

059203790

ABSTRACT:
A projection exposure system, which is used to transfer a pattern from a reticle or mask onto a substrate, incorporates a projection optical system that is capable of maintaining the same performance as that which can be found in an ideal environment, even when the actual use environment (e.g. atmospheric pressure and temperature) is not ideal. In addition, the projection optical system is able to recover the same performance as in an ideal environment through relatively minor adjustment of its projection optical system even when atmospheric pressure significantly changes due to, e.g., a change in location and altitude where the system is used.

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