Exposure apparatus

Details Exposure apparatus Exposure apparatus

1987-06-29

1989-03-14

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2754, G03B 2742

Patent

active

048128805

ABSTRACT:
Disclosed is an exposure apparatus used in photolithographic process in fabrication of semiconductor devices. More particularly, in an exposure apparatus using an excimer laser, the TTL alignment is achieved by using light with wavelengths of 300 to 400 nm, different from that of excimer laser for exposure, for the purpose of alignment.

REFERENCES:
patent: 4458994 (1984-07-01), Jain et al.
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4667109 (1987-05-01), Kano
patent: 4703166 (1987-10-01), Bruning

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