Plasma etching apparatus

Details Plasma etching apparatus Plasma etching apparatus

1981-08-26

1984-04-10

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PG, 204192E, 156345, 156646, 422906, B23K 900, C23F 102

Patent

active

044423381

ABSTRACT:
Disclosed ia a plasma etching apparatus in which an etching chamber accomodates a pair of parallel flat plate electrodes facing each other. The etching chamber is also provided with a device for applying high frequency power to one of the electrodes and a system for introducing a reactive gas. An after-treatment chamber is connected to the etching chamber and provided with a system for introducing a heated gas into the interior, a partition means for hermetically partitioning the etching chamber and after-treatment chamber, and a system for transporting the workpiece in the etching chamber into the after-treatment chamber.

REFERENCES:
patent: 4057460 (1977-11-01), Saxena et al.
patent: 4183781 (1980-01-01), Eldridge et al.
patent: 4252595 (1981-02-01), Yamamoto et al.
patent: 4321104 (1982-03-01), Hasegawa et al.
patent: 4335506 (1982-06-01), Chiu et al.

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