Counterbalanced polishing apparatus

Abrasive tool making process – material – or composition – With carbohydrate or reaction product thereof

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Details

511314, 511659, B24B 500

Patent

active

048115223

ABSTRACT:
Improved polishing apparatus. The apparatus includes a polishing head which holds a semiconductor wafer against a polishing surface. The apparatus permits the accurate application in small increments of pressure to the semiconductor wafer and provides a polishing head which "floats" and quickly reacts to and compensates for minor variations in the contour of the polishing surface contacting the semiconductor wafer.

REFERENCES:
patent: 1493787 (1924-05-01), Little
patent: 1800307 (1931-04-01), Marschke
patent: 3897660 (1975-08-01), Chijiwa
patent: 4313284 (1982-02-01), Walsh

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