Silicon light emitting device and a method of making the device

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 2, 357 52, 357 59, 357 91, H01L 4500, H01L 3300, H01L 2904, H01L 2934

Patent

active

046849645

ABSTRACT:
A light emitting device comprises a body of silicon having regions of opposite conductivity type and a region about the p-n junction between the regions of opposite conductivity type which contains lattice defects and excess hydrogen. This device emits light at a wavelength between about 1.2 and about 1.3 micrometers. The method of the invention includes the steps of damaging the region about the p-n junction and hydrogenating the damage region.

REFERENCES:
patent: 4113514 (1978-09-01), Pankove et al.
patent: 4224084 (1980-09-01), Pankove
patent: 4266986 (1981-05-01), Benton et al.
patent: 4315782 (1982-02-01), Tarng
patent: 4322253 (1982-03-01), Pankove et al.
C. H. Seager et al, "Passivation of Grain Boundaries in Polycrystalline Silicon", Applied Physics Letters, vol. 34 (1979), pp. 337-334.
M. H. Brodsky, "Silicon Light-Emitting Devices", IBM Technical Disclosure Bulletin, vol. 16 (1973), p. 704.
J. I. Pankove, "Photoluminescence Recovery in Rehydrogenated Amorphous Silicon", Applied Physics Letters, vol. 32, No. 12 (1978), pp. 812-813.
J. T. Pankove and C. P. Wu, "Photoluminescence from Hydrogenated Ion-Implanted Crystalline Suilicon", Applied Physics Letters, vol. 35, No. 12 (1979), pp. 937-939.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silicon light emitting device and a method of making the device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon light emitting device and a method of making the device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon light emitting device and a method of making the device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-886431

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.